| Reactive magnetron sputtering of hard Si–B–C–N films with a high-temperature oxidation resistance J Vlček, © Potocký, J Číľek, J Houąka, M Kormunda, P Zeman, V Peřina, ... Journal of Vacuum Science & Technology A 23 (6), 1513-1522, 2005 | 97 | 2005 |
| Process stabilization and a significant enhancement of the deposition rate in reactive high-power impulse magnetron sputtering of ZrO2 and Ta2O5 films J Vlček, J Rezek, J Houąka, R Čerstvý, R Bugyi Surface and Coatings Technology 236, 550-556, 2013 | 88 | 2013 |
| Benefits of the controlled reactive high-power impulse magnetron sputtering of stoichiometric ZrO2 films J Vlček, J Rezek, J Houąka, T Kozák, J Kohout Vacuum 114, 131-141, 2015 | 75 | 2015 |
| Overview of optical properties of Al2O3 films prepared by various techniques J Houska, J Blazek, J Rezek, S Proksova Thin Solid Films 520 (16), 5405-5408, 2012 | 71 | 2012 |
| Influence of substrate bias voltage on structure and properties of hard Si–B–C–N films prepared by reactive magnetron sputtering J Houąka, J Vlček, © Potocký, V Peřina Diamond and related materials 16 (1), 29-36, 2007 | 67 | 2007 |
| Significant improvement of the performance of ZrO2/V1-xWxO2/ZrO2 thermochromic coatings by utilizing a second-order interference J Houska, D Kolenaty, J Vlcek, T Barta, J Rezek, R Cerstvy Solar energy materials and solar cells 191, 365-371, 2019 | 62 | 2019 |
| Properties of nanocrystalline Al–Cu–O films reactively sputtered by DC pulse dual magnetron J Blaľek, J Musil, P Stupka, R Čerstvý, J Houąka Applied Surface Science 258 (5), 1762-1767, 2011 | 57 | 2011 |
| High-rate reactive high-power impulse magnetron sputtering of hard and optically transparent HfO2 films J Vlček, A Belosludtsev, J Rezek, J Houąka, J Čapek, R Čerstvý, S Haviar Surface and Coatings Technology 290, 58-64, 2016 | 56 | 2016 |
| Characterization of thermochromic VO2 (prepared at 250° C) in a wide temperature range by spectroscopic ellipsometry J Houska, D Kolenaty, J Rezek, J Vlcek Applied Surface Science 421, 529-534, 2017 | 52 | 2017 |
| Effect of the gas mixture composition on high-temperature behavior of magnetron sputtered Si–B–C–N coatings J Čapek, S Hřeben, P Zeman, J Vlček, R Čerstvý, J Houąka Surface and Coatings Technology 203 (5-7), 466-469, 2008 | 50 | 2008 |
| Controlled reactive HiPIMS—Effective technique for low-temperature (300° C) synthesis of VO2 films with semiconductor-to-metal transition J Vlček, D Kolenatý, J Houąka, T Kozák, R Čerstvý Journal of Physics D: Applied Physics 50 (38), 38LT01, 2017 | 48 | 2017 |
| Atomistic simulations of the characteristics of TiSiN nanocomposites of various compositions J Houska, JE Klemberg-Sapieha, L Martinu Surface and Coatings Technology 203 (22), 3348-3355, 2009 | 45 | 2009 |
| Effect of B and the Si/C ratio on high-temperature stability of Si–B–C–N materials J Houąka, J Vlček, S Hřeben, MMM Bilek, DR McKenzie Europhysics Letters 76 (3), 512, 2006 | 42 | 2006 |
| Effect of nitrogen content on electronic structure and properties of SiBCN materials V Petrman, J Houska, S Kos, P Calta, J Vlcek Acta Materialia 59 (6), 2341-2349, 2011 | 40 | 2011 |
| Pathway for a low-temperature deposition of α-Al2O3: A molecular dynamics study J Houska Surface and Coatings Technology 235, 333-341, 2013 | 37 | 2013 |
| High-performance thermochromic VO2-based coatings with a low transition temperature deposited on glass by a scalable technique D Kolenatý, J Vlček, T Bárta, J Rezek, J Houąka, S Haviar Scientific Reports 10 (1), 11107, 2020 | 36 | 2020 |
| Microstructure of hard and optically transparent HfO2 films prepared by high-power impulse magnetron sputtering with a pulsed oxygen flow control NW Pi, M Zhang, J Jiang, A Belosludtsev, J Vlček, J Houąka, EI Meletis Thin Solid Films 619, 239-249, 2016 | 34 | 2016 |
| Trends in formation energies and elastic moduli of ternary and quaternary transition metal nitrides V Petrman, J Houska Journal of Materials Science 48, 7642-7651, 2013 | 33 | 2013 |
| Experimental and molecular dynamics study of the growth of crystalline TiO2 J Houska, S Mraz, JM Schneider Journal of Applied Physics 112 (7), 2012 | 33 | 2012 |
| High-rate reactive high-power impulse magnetron sputtering of Ta–O–N films with tunable composition and properties J Rezek, J Vlček, J Houąka, R Čerstvý Thin Solid Films 566, 70-77, 2014 | 32 | 2014 |
