Interfacial chemistry of MG Mason, CW Tang, LS Hung, P Raychaudhuri, J Madathil, DJ Giesen, ...
Journal of Applied Physics 89 (5), 2756-2765, 2001
422 2001 A photoelectron spectroscopy study on the indium tin oxide treatment by acids and bases F Nüesch, LJ Rothberg, EW Forsythe, QT Le, Y Gao
Applied Physics Letters 74 (6), 880-882, 1999
320 1999 Photoemission study of aluminum/tris-(8-hydroxyquinoline) aluminum and aluminum/LiF/tris-(8-hydroxyquinoline) aluminum interfaces QT Le, L Yan, Y Gao, MG Mason, DJ Giesen, CW Tang
Journal of Applied Physics 87 (1), 375-379, 2000
251 2000 Importance of indium tin oxide surface acido basicity for charge injection into organic materials based light emitting diodes F Nüesch, EW Forsythe, QT Le, Y Gao, LJ Rothberg
Journal of Applied Physics 87 (11), 7973-7980, 2000
202 2000 Photoemission study of the interface between phenyl diamine and treated indium–tin–oxide QT Le, F Nüesch, LJ Rothberg, EW Forsythe, Y Gao
Applied physics letters 75 (10), 1357-1359, 1999
111 1999 Analysis of titanium dental implants after failure of osseointegration: Combined histological, electron microscopy, and X‐ray photoelectron spectroscopy approach A Arys, C Philippart, N Dourov, Y He, QT Le, JJ Pireaux
Journal of biomedical materials research 43 (3), 300-312, 1998
99 1998 The removal of copper oxides by ethyl alcohol monitored in situ by spectroscopic ellipsometry A Satta, D Shamiryan, MR Baklanov, CM Whelan, QT Le, GP Beyer, ...
Journal of The Electrochemical Society 150 (5), G300, 2003
89 2003 Interface formation between NPB and processed indium tin oxide QT Le, EW Forsythe, F Nüesch, LJ Rothberg, L Yan, Y Gao
Thin Solid Films 363 (1-2), 42-46, 2000
79 2000 Quantification of processing damage in porous low dielectric constant films MR Baklanov, KP Mogilnikov, QT Le
Microelectronic Engineering 83 (11-12), 2287-2291, 2006
66 2006 Factors affecting an efficient sealing of porous low-k dielectrics by physical vapor deposition Ta(N) thin films F Iacopi, Z Tőkei, QT Le, D Shamiryan, T Conard, B Brijs, U Kreissig, ...
Journal of applied physics 92 (3), 1548-1554, 2002
62 2002 Surface modification of PET films with RF plasma and adhesion of in situ evaporated Al on PET QT Le, JJ Pireaux, JJ Verbist
Surface and interface analysis 22 (1‐12), 224-229, 1994
58 1994 Removal of plasma-modified low-k layer using dilute HF: Influence of concentration QT Le, MR Baklanov, E Kesters, A Azioune, H Struyf, W Boullart, ...
Electrochemical and Solid-State Letters 8 (7), F21, 2005
57 2005 XPS/AFM study of the PET surface modified by oxygen and carbon dioxide plasmas: Al/PET adhesion QT Le, JJ Pireaux, R Caudano, P Leclere, R Lazzaroni
Journal of adhesion science and technology 12 (9), 999-1023, 1998
54 1998 XPS study of the PET film surface modified by CO2 plasma: Effects of the plasma parameters and ageing QT Le, JJ Pireaux, R Caudano
Journal of adhesion science and technology 11 (5), 735-751, 1997
53 1997 Feasibility study of fully self aligned vias for 5nm node BEOL G Murdoch, J Bömmels, CJ Wilson, KB Gavan, QT Le, Z Tőkei, W Clark
2017 IEEE International Interconnect Technology Conference (IITC), 1-4, 2017
38 2017 Removal of post-etch photoresist and sidewall residues using organic solvent and additive combined with physical forces QT Le, M Claes, T Conard, E Kesters, M Lux, G Vereecke
Microelectronic engineering 86 (2), 181-185, 2009
35 2009 Effect of UV irradiation on modification and subsequent wet removal of model and post-etch fluorocarbon residues QT Le, JF De Marneffe, T Conard, I Vaesen, H Struyf, G Vereecke
Journal of The Electrochemical Society 159 (3), H208, 2011
33 2011 Sealing of Porous Low-k Dielectrics: Ellipsometric Porosimetry Study of Oxidized Films CM Whelan, QT Le, F Cecchet, A Satta, JJ Pireaux, P Rudolf, K Maex
Electrochemical and solid-state letters 7 (2), F8, 2003
33 2003 Minimizing plasma damage and in situ sealing of ultralow-k dielectric films by using oxygen free fluorocarbon plasmas G Mannaert, MR Baklanov, QT Le, Y Travaly, W Boullart, ...
Journal of Vacuum Science & Technology B: Microelectronics and Nanometer …, 2005
30 2005 X-ray photoelectron spectroscopy and atomic force microscopy investigation of stability mechanism of tris-(8-hydroxyquinoline) aluminum-based light-emitting devices QT Le, FM Avendano, EW Forsythe, L Yan, Y Gao, CW Tang
Journal of Vacuum Science & Technology A: Vacuum, Surfaces, and Films 17 (4 …, 1999
30 1999 
Yongli GaoProfessor of Physics, University of RochesterAdresă de e-mail confirmată pe pas.rochester.edu
