| Optical and EUV projection lithography: A computational view A Erdmann, T Fühner, P Evanschitzky, V Agudelo, C Freund, P Michalak, ... Microelectronic Engineering 132, 21-34, 2015 | 34 | 2015 |
| Application of artificial neural networks to compact mask models in optical lithography simulation V Agudelo, T Fühner, A Erdmann, P Evanschitzky Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (1), 011002, 2013 | 17 | 2013 |
| Modeling of mask diffraction and projection imaging for advanced optical and EUV lithography A Erdmann, F Shao, V Agudelo, T Fühner, P Evanschitzky Journal of Modern Optics 58 (5-6), 480-495, 2011 | 13 | 2011 |
| Accuracy and performance of 3D mask models in optical projection lithography V Agudelo, P Evanschitzky, A Erdmann, T Fühner, F Shao, S Limmer, ... Optical Microlithography XXIV 7973, 79730O, 2011 | 11 | 2011 |
| Evaluation of various compact mask and imaging models for the efficient simulation of mask topography effects in immersion lithography V Agudelo, P Evanschitzky, A Erdmann, T Fühner Optical Microlithography XXV 8326, 832609, 2012 | 6 | 2012 |
| Novel method for automatic filtering in the Fourier space applied to digital hologram reconstruction OJ Rincon, R Amezquita, YM Torres, V Agudelo Optical Measurement Systems for Industrial Inspection VII 8082, 80822E, 2011 | 5 | 2011 |
| Simulación de la cuerda de un violín y una guitarra por diferencias finitas D Hernández, VA Agudelo, JD Muñoz, V Arias Revista Colombiana de Física 38 (2), 998, 2006 | 1 | 2006 |
| Firefly: an optical lithographic system for the fabrication of holographic security labels J Calderón, O Rincón, R Amézquita, I Pulido, S Amézquita, A Bernal, ... Optical Microlithography XXIX 9780, 97800U, 2016 | | 2016 |
| Digital Holographic Method to Characterize Spatial Light Modulator Devices R Amezquita, OJ Rincon, M Torres, VA Agudelo, OE Olarte Biomedical Optics, JMA13, 2010 | | 2010 |
| Simulación del proceso de reconstrucción de un holograma arco iris V Agudelo, G Arenas, R Amézquita Revista Colombiana de Física 38 (2), 549, 2006 | | 2006 |
| Compact Mask Models for Optical Projection Lithography Kompakte Maskenmodelle für die optische Projektionslithographie V Agudelo | | |
