| Absence of negative ion effects during on‐axis single target sputter depositions of Y‐Ba‐Cu‐O thin films on Si (100) M Migliuolo, RM Belan, JA Brewer Applied physics letters 56 (25), 2572-2574, 1990 | 37 | 1990 |
| Magnetron sputter deposition of magnetic materials from thick targets JA Brewer, M Migliuolo, RM Belan Proc. Annu. Tech. Conf. Soc. Vac. Coaters 33, 37-42, 1990 | 6 | 1990 |
| Rectangular Hollow Sputter Source and Method of use Thereof RM Belan, KJ Lesker III US Patent App. 14/868,688, 2016 | 1 | 2016 |
| Surrounding field sputtering source M Jaszcar, RM Belan, KJ Lesker III US Patent 10,358,713, 2019 | | 2019 |
| Hermetically sealed magnetic keeper cathode M Jaszcar, RM Belan, R Patterson US Patent 10,115,574, 2018 | | 2018 |
| Absence of Oxygen Resputtering During On-Axis Single Target Depositions ofY-Ba-Cu-O Thin Films M Migliuolo, RM Belan, JA Brewer, PA Clairton High TeDlperature Superconductivity, 403, 0 | | |
