| Dr. LiTHO: a development and research lithography simulator T Fühner, T Schnattinger, G Ardelean, A Erdmann Optical Microlithography XX 6520, 1226-1237, 2007 | 97 | 2007 |
| Toward automatic mask and source optimization for optical lithography A Erdmann, T Fuehner, T Schnattinger, B Tollkuehn Optical Microlithography XVII 5377, 646-657, 2004 | 95 | 2004 |
| A physically based model for the spatial and temporal evolution of self-interstitial agglomerates in ion-implanted silicon CJ Ortiz, P Pichler, T Fühner, F Cristiano, B Colombeau, NEB Cowern, ... Journal of applied physics 96 (9), 4866-4877, 2004 | 81 | 2004 |
| Improved mask and source representations for automatic optimization of lithographic process conditions using a genetic algorithm T Fuhner, A Erdmann Optical Microlithography XVIII 5754, 415-426, 2005 | 69 | 2005 |
| Rigorous mask modeling using waveguide and FDTD methods: an assessment for typical hyper-NA imaging problems A Erdmann, P Evanschitzky, G Citarella, T Fühner, P De Bisschop Photomask and Next-Generation Lithography Mask Technology XIII 6283, 338-348, 2006 | 47 | 2006 |
| Use of genetic algorithms for the development and optimization of crystal growth processes T Fühner, T Jung Journal of crystal growth 266 (1-3), 229-238, 2004 | 43 | 2004 |
| Direct optimization approach for lithographic process conditions T Fühner, A Erdmann, S Seifert Journal of Micro/Nanolithography, MEMS and MOEMS 6 (3), 031006-031006-20, 2007 | 40 | 2007 |
| Optical and EUV projection lithography: A computational view A Erdmann, T Fühner, P Evanschitzky, V Agudelo, C Freund, P Michalak, ... Microelectronic Engineering 132, 21-34, 2015 | 34 | 2015 |
| Genetic algorithms to improve mask and illumination geometries in lithographic imaging systems T Fühner, A Erdmann, R Farkas, B Tollkühn, G Kókai Applications of Evolutionary Computing: EvoWorkshops 2004: EvoBIO, EvoCOMNET …, 2004 | 30 | 2004 |
| Modeling studies on alternative EUV mask concepts for higher NA A Erdmann, T Fühner, P Evanschitzky, JT Neumann, J Ruoff, P Gräupner Extreme Ultraviolet (EUV) Lithography IV 8679, 495-506, 2013 | 28 | 2013 |
| Extended Abbe approach for fast and accurate lithography imaging simulations P Evanschitzky, A Erdmann, T Fühner 25th European Mask and Lithography Conference, 1-11, 2009 | 28 | 2009 |
| Mutual source, mask and projector pupil optimization T Fühner, P Evanschitzky, A Erdmann Optical Microlithography XXV 8326, 179-190, 2012 | 27 | 2012 |
| Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography A Erdmann, F Shao, P Evanschitzky, T Fühner | 25 | 2010 |
| Lithography simulation: modeling techniques and selected applications A Erdmann, T Fühner, F Shao, P Evanschitzky Modeling Aspects in Optical Metrology II 7390, 13-29, 2009 | 25 | 2009 |
| Simulation-based EUV source and mask optimization T Fühner, A Erdmann, P Evanschitzky Photomask Technology 2008 7122, 651-664, 2008 | 21 | 2008 |
| Hardware and software framework for an open battery management system in safety-critical applications M Akdere, M Giegerich, M Wenger, R Schwarz, S Koffel, T Fühner, ... IECON 2016-42nd Annual Conference of the IEEE Industrial Electronics Society …, 2016 | 20 | 2016 |
| Artificial evolution for the optimization of lithographic process conditions T Fühner Friedrich-Alexander-Universität Erlangen-Nürnberg (FAU), 2014 | 17 | 2014 |
| Application of artificial neural networks to compact mask models in optical lithography simulation V Agudelo, T Fühner, A Erdmann, P Evanschitzky Journal of Micro/Nanolithography, MEMS, and MOEMS 13 (1), 011002-011002, 2014 | 17 | 2014 |
| Mask and source optimization for lithographic imaging systems A Erdmann, R Farkas, T Fuehner, B Tollkuehn, G Kokai Wave-Optical Systems Engineering II 5182, 88-102, 2003 | 17 | 2003 |
| Predictive modeling of EUV-lithography: the role of mask, optics, and photoresist effects A Erdmann, P Evanschitzky, F Shao, T Fühner, GF Lorusso, E Hendrickx, ... Physical Optics 8171, 142-157, 2011 | 16 | 2011 |
Dr. Viviana AgudeloApplied Optics ResearcherVerified email at unal.edu.co
